FF IP Engg Data
FF IP Engg Data
Description
INDION FFIP is a Type 1 strong base, unifunctional mixed bed de-ionising, where high quality de-ionized
anion exchange resin in bead form, containing water and lowest silica residuals are desired.
trimethyl benzyl ammonium groups. It is based on
cross-linked polystyrene and has an isoporous
structure. In addition INDION FFIP demonstrates stability to high
temperature regeneration required for minimum silica
INDION FFIP has a very high basicity. It is effective in leakage. It has a high reversible capacity for the natural
removing weak acids such as silica and carbon dioxide organic matter present in some surface waters, with
and recommended in two stage/multiple stage or excellent resistance to fouling by this organic matter.
Characteristics
Capacity Adjustment
50
25
35
0
30
0.95
25
20
15
30 40 50 60 70 80 90 100 120 150 0.9
Regeneration Level kg NaOH/m3 4 5 6 7 8 9 10 11
EMA = Equivalent Mineral Acidity Exhaustion Time in Hours
30
1.5
40 25
30 20
1.0
15
20
10
0.5
10 60 80 100 120 140 160
3
Regeneration Level kg NaOH/m
SiO2/TA >80%
0 20 40 60 80 100
32 35
30
31
25
30
20
29
15
28 10
27 5
26 0
30 40 50 60 70 80 90 100 110 120 130 140 150 160
25
Regeneration Level kg NaOH/m3
24
30 40 50 60 70 80 90 100 End-point Silica 0.20 mg/I SiO2/TA* > 80%
Regeneration Level kg NaOH/m3
1.1 30
25
Correction Factor
1.0 20
15
0.9 10
0.8 0
10 20 50 100 200 500 1000 30 40 50 60 70 80 90 100 110 120 130 140 150 160
Silica End-point (above average leakage) ppb SiO2 Regeneration Level kg NaOH/m3
0.02 0.02
1 2 4 6 8 10 20 40 60 100 2 4 6 8 10 20 40 60 100
SiO2/ TA % SiO2/ TA %
A correctly designed and operated mixed bed unit during the treatment run. This loading can be
using INDION FFIP with INDION 225 strong acid calculated from the silica content of the feed water and
cation exchange resin will produce treated water with a the volume of water treated per run.
conductivity of 0.5 microsiemens/cm or less. When the
To maintain any desired silica residual level in the
mixed bed units preceded by two-stage de-ionising,
treated water, reference should be made to Figures
conductivity of 0.1 mircosiemens/cm is easily achieved.
15-18. These graphs give the maximum silica loading
The silica content of the treated water from a mixed bed that INDION FFIP will tolerate at various regeneration
unit depends upon the level and temperature of the levels and temperatures to maintain the required silica
regenerant used for INDION FFIP and the silica loading residuals.
Total Bed depth …………………… 1.0 - 2.4 m using INDION FFIP and INDION 225 resin
Rising space …………………………… 75% of bed depth
3 2
Treatment flowrate ……………………… 60 m /h m ,maximum
Pressure loss ……………………………. 1.2 kg/cm2 ,maximum
Bed separation .………………………… 9 m3/h m2 for 10 minutes
Bed settlement …………………………. Allow 5 minutes after separation before commencing
injection of regenerants
Regenerant ……………………………… Sodium hydroxide for INDION FFIP
Hydrochloric acid/Sulphuric acid for INDION 225
Acid injection rate …………………….. 4.5-18 m3/h m2 for 6-10 minutes with 2-5% w/v acid
Down flow ……………………………… 1.5 m3/h m2
Acid rinse …………………….………… 2 bv
Down flow ………………………………. 1.5 m3/h m2
Alkali Injection rate …….………………. 4.5-18 m3/h m2 for 10-15 minutes with 2-5% w/v alkali
Upflow …..…..…………………………… 4.5 m3/h m2
Alkali rinse …..….…………….…………. 4 bv in 10-15 minutes
Upflow …..…..…………………………… 4.5 m3/h m2
Unit drain down ………………………… Before re-mixing the resin, the water level should be
lowered to approximately 0.4 m above the bed.
Bed remix …………………………………. 2m3/minute m2 oil free air at 0.4 kg/cm2 pressure for 10
minutes
Settle bed, refill unit, final rinse…………… These operations should be carried out in such a way to
avoid separation of the two resins. Final rinse to
satisfactory water quality should be effected at the
treatment flowrate, or at 24 m3/h m2, whichever is greater.
Total time required is normally about 5-10 minutes
depending upon end point conductivity required.
MIXED BED DE-IONISING MIXED BED DE-IONISING
0
Residual Silica - Regeneration Temperature 10 C Residual Silica - Regeneration Temperature 600C
Figure 15 Figure 18
7 Regeneration 9
level kg. NaOH/m3 Regeneration
6 100 8 level kg. NaOH/m3
80
90
5 7
70
4 6
60
70
3 5
60
2 4
50
1 3
0.01 0.02 0.03 0.04 0.05 0.01 0.02 0.03 0.04 0.05
Residual Silica ppm SiO2 Residual Silica ppm SiO2
PRESSURE LOSS
MIXED BED DE-IONISING
Figure 19
0
Residual Silica - Regeneration Temperature 25 C 1.0
0.8
Figure 16
0.6
Pressure Loss bar/m Bed Depth
7 Regeneration 0.4
level kg. NaOH/m3
6
0.2 Temperature0C 5
5 80
70 20
4 0.1 40
60
0.08 70
3
0.06 90
2 0.04
1
0.01 0.02 0.03 0.04 0.05 0.02
6 80
80
10
5
70
60
20
4 60
40 40
3
20
2
1
0.01 0.02 0.03 0.04 0.05 0 2 4 6 8 10 12 14 16
Residual Silica ppm SiO2 Backwash Rate m/h
Bulletin R012R2
INDION range of Ion Exchange resins are produced in a state-of-the-art ISO 9001 and ISO 14001 certified manufacturing facilities at Ankleshwar,
in the state of Gujarat in India.
To the best of our knowledge the information contained in this publication is accurate. Ion Exchange (India) Ltd. maintains a policy of continuous
development and reserves the right to amend the information given herein without notice.
is the registered trademark of Ion Exchange (India) Ltd.